Photomask substrates

Description Review

Description

Photomask transparent substrate is the base material for making photomask. the material can be synthetic quartz,schott B270i,soda lime, ultra clear glass or other optical glass according to customer needs.
The surface has high-quality properties such as high flatness, high parallel,high optical transmission，and no defects on the surface or inside of the material after precision finishing .
Photomasks are widely used in IC(Integrated Circuit), FPD (Flat Panel Display),PCB (Printed Circuit Board),MEMS (Micro Electro Mechanical Systems) and other fields.

Specifications

product name	Product description: Photomask transparent substrate
material	quartz/soda lime/schott B270 etc
Size1	3"/4"/5"/6"/7"/9"
Size2	508609.6mm/620720mm/700800mm/800960mm
Thickness1	>0.3mm
Thickness2	>0.8mm
TTV1	<2um
TTV2	<10um
surface quality	Zero grade/ MIL 60/40

Review

Send your message to us